利用FIB制備TEM樣品簡明教程

1、 Recipe of making TEM sample9/15/2014 Deposition E-beam depositon (10 minutes)Voltage(kV)Current(nA)Size(m)X*Y*ZStage degree()SiO251.610*2*50Pt51.610*2*10 Ion-beam deposion (15 minutes)Voltage(kV)CurrentSize(m)X*Y*ZStage degree()Pt2081pA10*2*0.752Pt300.1nA10*2*0.752 U-cut (25 minutes)Voltage (kV)Cur

2、rent (nA)Size (m)X*Y*ZStage degree ()Regular cross-section30515*4*253 (front side)Regular cross-section30515*8*451 (back side)Clean cross-section30115*y*253 (front side)Clean cross-section30115*y*251 (back side)U-cut3010 Lift-out (20 minutes) Voltage(kV)CurrentSize(m)X*Y*ZStage degree()Bond probe wi

3、th sample3050pA0Cut to release sample301nA0Bond sample with grid3050pA0Cut the probe bond 301nA0 Thin down to 600nmVoltage (kV)Current (nA)Size (m)X*Y*ZStage degree ()Clean cross-section300.58*y*253 (front side)Clean cross-section300.58*y*251 (back side)For reducing the redeposion, the front and bac

4、k sides need to be thinned repeatedly. Every thinning time shall less than one minute, then move to the other side to work. Thin down (10 minutes)Voltage (kV)Current (pA)Size (m)X*Y*ZStage degree ()Clean cross-section20378*y*253 (front side)Clean cross-section20378*y*251 (back side)Thin down to 200n

5、m (15 minutes)Voltage (kV)Current (pA)Size (m)X*Y*ZStage degree ()Clean cross-section20378*y*353 (front side)Clean cross-section20378*y*351 (back side)Thin down to less than 100nm (15 minutes)Voltage (kV)Current (pA)Size (m)X*Y*ZStage degree ()Clean cross-section10238*y*353 (front side)Clean cross-section10238*y*351 (back side)Clean cross-section5298*y*353