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DUVSCANNER&I-LINESCANNERSystemoverview1第1頁SCANNERFUNCTIONSFunctionGetsresist-coatedwafersfromtheTrackExposethewafersSendsthewafersbacktotheTrackfordevelopingThepatterntoexposeisonthereticle.Thescannerwillalignthereticlesothatthepatterncanbeexposedaccuratelyonthewafer.Someparameters:ExposureenergyandFocusExposureFieldP,EandDchucksPrimaryMakersAlignment2第2頁OVERVIEWOFSYSTEMDUVScannerI-lineScannerTheDUVscannersareconnectedtotheDUVTracks.ForcriticallayersTheI-linescannersareconnectedtotheI-linetracks.Fornon-criticallayers.3第3頁OVERVIEWOFSYSTEMD-chuckE-chuckP-chuckRobotInOut12344第4頁OVERVIEWOFFUNCTIONSSequenceofeventsEdgePre-alignmentOpticalPre-alignmentGlobalAlignmentExposureDischarge5第5頁EDGEPRE-ALIGNMENT

WhatisEdgePre-alignment??DuringEdgePre-alignment,thescannerlooksforthenotchonthewafer.Thiswilltellthemachinetheorientationofthewafer.ThisistoenablethemachinetoplacethewaferaccuratelyontheP-chuck. Howdoesitwork??ThewaferisrotatedunderalaserbeamalongtheedgeThebeamwillsearchforthenotchatthewaferedge WhydoweneedEdgePre-alignment?SothatthewaferwillbeplacedaccuratelyontheP-chuck.6第6頁OPTICALPRE-ALIGNMENT

WhatisOpticalPre-alignment?AsensorlooksforthePrimaryMarkersonthewafer.ThisimprovestheaccuracyoftheEdgePre-alignment Howdoesitwork??Thewaferisrotatedunderaopticalsensor.Thesensorwilllookforthe2Primary Markersonthewafer WhydoweneedOpticalPre-alignment??ThisimprovestheaccuracyoftheEdgePre-alignment.7第7頁GLOBALALIGNMENT

WhatisGlobalAlignment??Duringglobalalignment,thewaferisveryaccuratelyaligned.Thereticleisalsoaligned.GlobalAlignmentisdoneontheP-Chuck Howdoesitwork??ThescannerwillalignusingthePrimaryMarkersonthewafer WhydoweneedGlobalAlignmentThisisthefinalalignmentbeforeexposure.Thisensuresthatthereticleisalsoalignedbeforeexposure.Thisisveryimportantforgoodoverlay!8第8頁THISISWHATHAPPENSWHENALIGNMENTISNOTDONEPROPERLYThecurrentlayerisnotpositioneddirectlyoverthepreviouslayers9第9頁SOMEMOREEXAMPLESThecurrentlayerisnotpositioneddirectlyoverthepreviouslayers10第10頁EXPOSURE

WhatisExposure??Duringexposure,thepatternonthereticleistransferredtothewafer.Thescannerusesalaserorlighttoexposethepatternonthephoto-sensitiveresist. Howdoesitwork?ThewaferisplacedontheE-Chuck.ThereticleisplacedontheReticleStage.TheWaferStagemovestogetherwiththeReticleStageinoppositedirectionstoexposethepattern11第11頁EXPOSUREThepatternisexposedmanytimesoverthewholewaferEachexposureiscalleda“exposurefield”,asshownbytheredsquareNormally,thereareabout>60fieldsperwaferEachfieldwillcontainmanydiedesigns.12第12頁EXPOSUREThisis1reticlefield.Thisreticlehas6x4diesinthedesign.13第13頁DISCHARGEAfterthew

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