FAB4-Litho-Reticle-Basic教學(xué)講解課件

PreparedbyPorpoise19thJun.2005FAB4LithoReticleBasicTrainingPreparedbyPorpoiseFAB4LithoContents

ReticleBasicReticleInspectionReticleManagementOCAPDefectReviewQ&AContentsReticleBasicReticleBasicReticleorMaskReticleStructureReticleTypesPellicleandFunctionSMICReticleLayoutMixingRunCriteriaReticleOrientationinM/CReticlePodReticleBasicReticleorMaskReticleBasic:ReticleorMaskMask:Aglassplatecoveredwithanarrayofpatternsusedinthephotolithography.Amask’spatternsarethesamesizeasthefinalsizeofthepatternonthewafer.Reticle:Areproductionofthepatterntobeimagedonthewafer(ormask)byastep-andrepeatprocessTheactualsizeofthepatternonthereticleisusuallyseveraltimesthefinalsizeofthepatternonthewafer.Difference:Areticleisdifferentfromamaskonlyinrespecttothesizeofthepattern.ReticleBasic:ReticleorMaskReticleBasic:ReticleStructureQuartz:Verylowthermalcoefficient;hightransmissionfor193nmwavelengthandaboveDoubleSideadhesivePellicleMembrane:nitrocellulose;thickness2~5um;hightransmissionrateforspecificwavelengthPellicleFrame:frameheight5~6.3mm;AluminumAlloyCrorMoSixReticleBasic:ReticleStructuReticleBasic:ReticleTypesGenerallyreticlecanbeclassifiedasBIMandPSMmasks.AlternatingPSMAttenuatedPSMConventionalmaskEfieldonmaskEfieldonwaferIntensityonwaferNormalresolution,easytomanufacturing,lowercostHighresolution,goodforcontacthole,highercostHighresolution,butmasktoolingprocessisverycomplicated,highercostPhaseShiftMaskBInaryMaskReticleBasic:ReticleTypesGeReticleBasic:ReticleTypesAlternativePSM(Levensontype)AttenuatedPSM(Half-tonetype)PSMStrongWeakEmbeddedRim-shifterQuartzSpin-on-glassOutriggerChromelessReticleBasic:ReticleTypesAlReticleBasic:PellicleandFunctionWhydoweneedit?TopContaminantObjectPlanePellicleFilmBottomContaminantContaminantonPatternPlaneLenSystemUnfocusedTopContaminantImageUnfocusedBottomContaminantImageImagePlaneFocusedContaminantImageonWaferMaskPatternWaferSurfaceLightReticleBasic:PellicleandFuReticleBasic:PellicleandFunctionReticleBasic:PellicleandFuReticleBasic:SMICReticleLayoutCanonalignmentCanon

barcodeASMLbarcodeDateReticletitle/HRCClearoutwindowASMLpre-alignmentASMLalignmentSMIClogReleasePinR3R4R1R2ChromesidedownReticleBasic:SMICReticleLaReticleBasic:SMICReticleLayoutReticleBasic:SMICReticleLaReticleBasic:MixingRunCriteriaForWavelength:Resolution,pellicletype,pellicleheight193nmpelliclecanbeusedto248nmDUVandI-Linetools,butI-Linepelliclescannotbeusedon248&193nmtoolsduetotransmissionandpelliclelifetimeconcerns.

ForScannertype:

ReticlealignmentmarkASML:PA,MA,TISCanon:S-FRA(3)WaferalignmentmarkASML:PA,XPA,SPM,VSPM,SSPM,NSSM,NVSMCanon:XY8,XY6,XY4,20P4F(D)ReleasePin:ASMLonlyBarcode:positiondifferenceForprocess:Resolution,OPC,etcReticleBasic:MixingRunCritReticleBasic:ReticleOrientationinM/CASMLCanonReticleonScannerWaferinScannerChromesidedownReticleBasic:ReticleOrientaReticleBasic:MixingRunCriteriaSMIConlyhave2typesinglereticlepodforproduction.ReticleBasic:MixingRunCritReticleInspectionInspectionToolSLF27PrinciplesMonitorItemsInspectionFrequencyParticlespecReticleInspectionInspectionTReticleInspection:InspectionToolTwobasicmaskinspectiontoolwereusedinFAB4:ZarisandSLF27.Zarisisasemi-autotoolwhichintegratedmacroinspection,N2particlecleanreticleexchangeandpelliclemountingfunction.Inspectobject:GlassandpelliclesurfaceparticleSTARLightisamaskinspectiontoolwhichuseSimultaneousTransmittedAndReflectedLight

defectinspectiontechnology.Inspectobject:ChromeorMoSixside(D2D,SL)softdefectandharddefect,glassandpelliclesurfaceparticleReticleInspection:InspectionReticleInspection:SLF27PrinciplesPrincipleofDefectInspection:InspectionMethodsDietoDatabase

ComparetheliveimageswithDatabaseDietoDie

Comparethetwoadjacentdiesandshowthedifference

STARLightinspectionComparetheimageswithtransmittedandreflectedlightURSA:UnpatternedReticleSurfaceAnalysis

Dark-fielddefectpreviewonpelliclesandglass.ReticleInspection:SLF27PrinReticleInspection:SLF27PrinciplesDietoDatabaseDatabaseLiveImagePatternimageofdatabaseLiveimageinmemoryImageComputerComparisonCancatchdifferencebetweentwoversionmasksCancatchdefectsonscribelaneCaninspecteverymask(withdatabase)HigherinspectionfalsedefectrateReticleInspection:SLF27PrinReticleInspection:SLF27PrinciplesDietoDieLiveimageLiveimageImageComputerdefectdetectionHigheraccuracyonCDtoleranceerrorLowerinspectionfalsedefectrateCannotcatchdifferencebetweentwoversionCannotcatchdefectsonscribelaneCannotinspectthemaskwithoutrepeatdieReticleInspection:SLF27PrinReticleInspection:SLF27PrinciplesSTARLightinspectionComparetheimagesoftransmitlightwithreflectedlightCancatchsoftdefectsCaninspecteverymaskCannotcatchharddefectonmaskifitisbigenough2particlesInspectionArea01TransmittedSignal01Reflected

SignalT+R01Transmitted+ReflectedSLthresholdlevelDefectsReticleInspection:SLF27PrinReticleInspection:SLF27PrinciplesURSA:UnpatternedReticleSurfaceAnalysisCombinedwithSTARlightinspectschrome,glass,andbothpelliclesurfacesSensitivity4μm~2minutes/surfaceDark-fielddefectpreviewonpelliclesandglass,whileURSAorSTARlightinspectionsinprogressDefectrevieworderfromlargesttosmallestBright-field,reflected-lightreviewmicroscopeforlivereviewaftercompletionofinspectionyUseradjustablesizingboxfordefectmeasurementDefectcoordinatesreferencedtoSTARlightreferenceViewreticlepatternunderadefectonpellicleorglassReticleInspection:SLF27PrinReticleInspection:SLF27PrinciplesSLF27SystemOverview:LaserScanningSystemReticleInspection:SLF27PrinReticleInspection:SLF27PrinciplesDietoDieinspectionandSTARLightinspectionmethodcanbeconductedrespectivelyandcancombined(Combomethod)themalso.Itbenefitstohighthroughput.SLF27SystemOverview:AlgorithmReticleInspection:SLF27PrinReticleInspection:SLF27PrinciplesThereticleismovingwiththereticlestageandtheopticallenssystemwhilescanning.Threebeamsscansimultaneouslyinfavorofthroughput.Scanningspeedisrelatedtoscanmode(Pixels)andalgorithm.SLF27SystemOverview:ScanningModeReticleInspection:SLF27PrinReticleInspection:SLF27PrinciplesStandardmasksisusedtomonitorthemachinestatusandmachine’sdefectcaptureability,whichincludessomespecificdefectandthedefectcounts,theircoordinate,defecttypesareexactlydefined.SLF27SystemOverview:InspectionCapacityReticleInspection:SLF27PrinReticleInspection:MonitorItemsZaris:DryrunparticleReticle:P4DOT6-CHKAA-2JB

Particlecount(前值)Particlecount(后值)Particlecount(net)≤10um10~50um≥50um≤10um10~50um≥50um≤10um10~50um≥50um≤10≤20≤11≤20≤100ZarisparticlemonitorspecReticleInspection:MonitorItReticleInspection:MonitorItemsSLF27:DD,SL,URSASLF27monitorspecReticleInspection:MonitorItReticleInspection:InspectionFrequencySLF27:DD&SLroutineinspectionforhazecheckbasedonwafercountandhazestatus.ReticleInspection:InspectionReticleInspection:ParticlespecReticleInspection:ParticlesReticleManagement:ResponsibilityReticleOperationFlowReticleNameRuleOperationRulesRTMSReticleManagement:ResponsibilReticleManagement:ResponsibilityMFG：光罩的日常管理、日常檢查、光罩機(jī)臺(tái)的Monitor、光罩機(jī)臺(tái)的日常清理。新進(jìn)光罩的接收。LithoPE：確定光罩管理的規(guī)則、注意事項(xiàng)。O.I.的編制和更新。負(fù)責(zé)對(duì)MFG人員的Training和Certify。QE：新進(jìn)光罩的IQC，光罩返還Customer時(shí)的檢查。光罩外送時(shí)的包裝。PIE：制定光罩或產(chǎn)品的使用計(jì)劃。ReticleManagement:ResponsibiReticleManagement:ReticleOperationFlowShippingCassetteReticleStockerZaristodoN2cleaningNG,particlesRejectandSendtoMaskshoporcustomerReticleIncomingQualityCheckFlowZarismacroinspectionandpodexchangeSLF27Inspection(D2D,STARLightandURSA)ReleasetoFABOKOKNGOKOKNG,fataldefectReticleManagement:ReticleOpReticleManagement:ReticleOperationFlowReticleStockerZaristodoN2cleaningSendtoRepairReticleInspectionFlowDuringtheProductionParticlecheckScannerExposureReleasedReticlesOKOKOKParticlecheckCheckScannerstatusandreticlesendtocleanorrepairNGNGNG**:SLorDDinspectionmaybeaddedtocheckhazegrowthReticleManagement:ReticleOpReticleManagement:ReticleNameRuleReticleManagement:ReticleNaReticleManagement:ReticleNameRuleReticleManagement:ReticleNaReticleManagement:OperationRules光罩Title必須與光罩POD上的標(biāo)簽一致FAB內(nèi)光罩的Title是唯一的，沒(méi)有相同的兩塊光罩Run貨前后，更換機(jī)臺(tái)都需要做Zarisbrightlight的檢查;如果兩次run貨之間間隔時(shí)間<Qtime(12小時(shí)),可以不做Zaris的MacroInspection，但在Qtime之內(nèi)，如果要放入stock(N2Box)或change機(jī)臺(tái)run，必須進(jìn)行檢查。如果發(fā)現(xiàn)同一機(jī)臺(tái)unload下的光罩，兩塊以上均發(fā)現(xiàn)相似問(wèn)題（SurfaceParticle，Scratch..)，請(qǐng)立刻檢查機(jī)臺(tái)狀態(tài)。工程師以及未經(jīng)過(guò)certify的任何人在未通知MFGMaskMA情況下進(jìn)入maskroom視為MO.工程師向制造部借用之光罩的管理。每日工程師借用之光罩，歸還前后均應(yīng)該做Zarisbrightlight的檢查。工程師應(yīng)嚴(yán)格遵守光罩借出規(guī)定并登記、簽名，按時(shí)歸還。凡接觸光罩前務(wù)必確認(rèn)Ionizor是打開在更換光罩時(shí),無(wú)論光罩由水晶盒換入POD或由POD換入水晶盒,皆需在光罩專用ALU的Mini-Environment內(nèi),操作者必須帶口罩及手套小心接觸光罩邊緣,禁止將光罩曝露于MaskRoomMini-Environment以外的環(huán)境清潔時(shí)只能用棉花棒輕微接觸particle所在位置，禁止大面積地涂擦，并且清潔后必須用N2氣槍吹過(guò),并確認(rèn)清潔部位無(wú)殘留particle也沒(méi)有產(chǎn)生新的particle。棉花棒只適用于glassside,不可用于pellicleside。若glass面有大面積細(xì)小的particle時(shí)，不要采用棉花棒清潔，防止產(chǎn)生新的Particle。光罩更換時(shí)，對(duì)于ASML光罩，注意光罩正面(Glass面)朝上,Pellicle面朝下,二個(gè)“*”號(hào)朝自己的原則,將光罩放入POD內(nèi)；對(duì)于Canon光罩，光罩正面(Glass面)朝上,Pellicle面朝下,左右二個(gè)“*”號(hào)背離自己。主機(jī)臺(tái)上之ReticlePod只能放在機(jī)臺(tái)的Port上，不可重疊。ReticlePOD不能與WaferFOUP放在一起ReticleManagement:OperationReticleManagement:RTMSReticleManagement:RTMSReticleManagement:RTMSMFG：ReticleManagement:RTMSMFG：ReticleManagement:RTMSMFG：ReticleManagement:RTMSMFG：OCAPZarisCheckOCAPManualCheckOCAPRoutineSTLscanOCAPSLF27MonitorfailOCAPOCAPZarisCheckOCAPOCAPOCAPDefectReviewDefectReviewQ&AQ&AThankyou謝謝Q&A請(qǐng)您提問(wèn)Thankyou謝謝Q&A請(qǐng)您提問(wèn)PreparedbyPorpoise19thJun.2005FAB4LithoReticleBasicTrainingPreparedbyPorpoiseFAB4LithoContents

ReticleBasicReticleInspectionReticleManagementOCAPDefectReviewQ&AContentsReticleBasicReticleBasicReticleorMaskReticleStructureReticleTypesPellicleandFunctionSMICReticleLayoutMixingRunCriteriaReticleOrientationinM/CReticlePodReticleBasicReticleorMaskReticleBasic:ReticleorMaskMask:Aglassplatecoveredwithanarrayofpatternsusedinthephotolithography.Amask’spatternsarethesamesizeasthefinalsizeofthepatternonthewafer.Reticle:Areproductionofthepatterntobeimagedonthewafer(ormask)byastep-andrepeatprocessTheactualsizeofthepatternonthereticleisusuallyseveraltimesthefinalsizeofthepatternonthewafer.Difference:Areticleisdifferentfromamaskonlyinrespecttothesizeofthepattern.ReticleBasic:ReticleorMaskReticleBasic:ReticleStructureQuartz:Verylowthermalcoefficient;hightransmissionfor193nmwavelengthandaboveDoubleSideadhesivePellicleMembrane:nitrocellulose;thickness2~5um;hightransmissionrateforspecificwavelengthPellicleFrame:frameheight5~6.3mm;AluminumAlloyCrorMoSixReticleBasic:ReticleStructuReticleBasic:ReticleTypesGenerallyreticlecanbeclassifiedasBIMandPSMmasks.AlternatingPSMAttenuatedPSMConventionalmaskEfieldonmaskEfieldonwaferIntensityonwaferNormalresolution,easytomanufacturing,lowercostHighresolution,goodforcontacthole,highercostHighresolution,butmasktoolingprocessisverycomplicated,highercostPhaseShiftMaskBInaryMaskReticleBasic:ReticleTypesGeReticleBasic:ReticleTypesAlternativePSM(Levensontype)AttenuatedPSM(Half-tonetype)PSMStrongWeakEmbeddedRim-shifterQuartzSpin-on-glassOutriggerChromelessReticleBasic:ReticleTypesAlReticleBasic:PellicleandFunctionWhydoweneedit?TopContaminantObjectPlanePellicleFilmBottomContaminantContaminantonPatternPlaneLenSystemUnfocusedTopContaminantImageUnfocusedBottomContaminantImageImagePlaneFocusedContaminantImageonWaferMaskPatternWaferSurfaceLightReticleBasic:PellicleandFuReticleBasic:PellicleandFunctionReticleBasic:PellicleandFuReticleBasic:SMICReticleLayoutCanonalignmentCanon

barcodeASMLbarcodeDateReticletitle/HRCClearoutwindowASMLpre-alignmentASMLalignmentSMIClogReleasePinR3R4R1R2ChromesidedownReticleBasic:SMICReticleLaReticleBasic:SMICReticleLayoutReticleBasic:SMICReticleLaReticleBasic:MixingRunCriteriaForWavelength:Resolution,pellicletype,pellicleheight193nmpelliclecanbeusedto248nmDUVandI-Linetools,butI-Linepelliclescannotbeusedon248&193nmtoolsduetotransmissionandpelliclelifetimeconcerns.

ForScannertype:

ReticlealignmentmarkASML:PA,MA,TISCanon:S-FRA(3)WaferalignmentmarkASML:PA,XPA,SPM,VSPM,SSPM,NSSM,NVSMCanon:XY8,XY6,XY4,20P4F(D)ReleasePin:ASMLonlyBarcode:positiondifferenceForprocess:Resolution,OPC,etcReticleBasic:MixingRunCritReticleBasic:ReticleOrientationinM/CASMLCanonReticleonScannerWaferinScannerChromesidedownReticleBasic:ReticleOrientaReticleBasic:MixingRunCriteriaSMIConlyhave2typesinglereticlepodforproduction.ReticleBasic:MixingRunCritReticleInspectionInspectionToolSLF27PrinciplesMonitorItemsInspectionFrequencyParticlespecReticleInspectionInspectionTReticleInspection:InspectionToolTwobasicmaskinspectiontoolwereusedinFAB4:ZarisandSLF27.Zarisisasemi-autotoolwhichintegratedmacroinspection,N2particlecleanreticleexchangeandpelliclemountingfunction.Inspectobject:GlassandpelliclesurfaceparticleSTARLightisamaskinspectiontoolwhichuseSimultaneousTransmittedAndReflectedLight

defectinspectiontechnology.Inspectobject:ChromeorMoSixside(D2D,SL)softdefectandharddefect,glassandpelliclesurfaceparticleReticleInspection:InspectionReticleInspection:SLF27PrinciplesPrincipleofDefectInspection:InspectionMethodsDietoDatabase

ComparetheliveimageswithDatabaseDietoDie

Comparethetwoadjacentdiesandshowthedifference

STARLightinspectionComparetheimageswithtransmittedandreflectedlightURSA:UnpatternedReticleSurfaceAnalysis

Dark-fielddefectpreviewonpelliclesandglass.ReticleInspection:SLF27PrinReticleInspection:SLF27PrinciplesDietoDatabaseDatabaseLiveImagePatternimageofdatabaseLiveimageinmemoryImageComputerComparisonCancatchdifferencebetweentwoversionmasksCancatchdefectsonscribelaneCaninspecteverymask(withdatabase)HigherinspectionfalsedefectrateReticleInspection:SLF27PrinReticleInspection:SLF27PrinciplesDietoDieLiveimageLiveimageImageComputerdefectdetectionHigheraccuracyonCDtoleranceerrorLowerinspectionfalsedefectrateCannotcatchdifferencebetweentwoversionCannotcatchdefectsonscribelaneCannotinspectthemaskwithoutrepeatdieReticleInspection:SLF27PrinReticleInspection:SLF27PrinciplesSTARLightinspectionComparetheimagesoftransmitlightwithreflectedlightCancatchsoftdefectsCaninspecteverymaskCannotcatchharddefectonmaskifitisbigenough2particlesInspectionArea01TransmittedSignal01Reflected

SignalT+R01Transmitted+ReflectedSLthresholdlevelDefectsReticleInspection:SLF27PrinReticleInspection:SLF27PrinciplesURSA:UnpatternedReticleSurfaceAnalysisCombinedwithSTARlightinspectschrome,glass,andbothpelliclesurfacesSensitivity4μm~2minutes/surfaceDark-fielddefectpreviewonpelliclesandglass,whileURSAorSTARlightinspectionsinprogressDefectrevieworderfromlargesttosmallestBright-field,reflected-lightreviewmicroscopeforlivereviewaftercompletionofinspectionyUseradjustablesizingboxfordefectmeasurementDefectcoordinatesreferencedtoSTARlightreferenceViewreticlepatternunderadefectonpellicleorglassReticleInspection:SLF27PrinReticleInspection:SLF27PrinciplesSLF27SystemOverview:LaserScanningSystemReticleInspection:SLF27PrinReticleInspection:SLF27PrinciplesDietoDieinspectionandSTARLightinspectionmethodcanbeconductedrespectivelyandcancombined(Combomethod)themalso.Itbenefitstohighthroughput.SLF27SystemOverview:AlgorithmReticleInspection:SLF27PrinReticleInspection:SLF27PrinciplesThereticleismovingwiththereticlestageandtheopticallenssystemwhilescanning.Threebeamsscansimultaneouslyinfavorofthroughput.Scanningspeedisrelatedtoscanmode(Pixels)andalgorithm.SLF27SystemOverview:ScanningModeReticleInspection:SLF27PrinReticleInspection:SLF27PrinciplesStandardmasksisusedtomonitorthemachinestatusandmachine’sdefectcaptureability,whichincludessomespecificdefectandthedefectcounts,theircoordinate,defecttypesareexactlydefined.SLF27SystemOverview:InspectionCapacityReticleInspection:SLF27PrinReticleInspection:MonitorItemsZaris:DryrunparticleReticle:P4DOT6-CHKAA-2JB

Particlecount(前值)Particlecount(后值)Particlecount(net)≤10um10~50um≥50um≤10um10~50um≥50um≤10um10~50um≥50um≤10≤20≤11≤20≤100ZarisparticlemonitorspecReticleInspection:MonitorItReticleInspection:MonitorItemsSLF27:DD,SL,URSASLF27monitorspecReticleInspection:MonitorItReticleInspection:InspectionFrequencySLF27:DD&SLroutineinspectionforhazecheckbasedonwafercountandhazestatus.ReticleInspection:InspectionReticleInspection:ParticlespecReticleInspection:ParticlesReticleManagement:ResponsibilityReticleOperationFlowReticleNameRuleOperationRulesRTMSReticleManagement:ResponsibilReticleManagement:ResponsibilityMFG：光罩的日常管理、日常檢查、光罩機(jī)臺(tái)的Monitor、光罩機(jī)臺(tái)的日常清理。新進(jìn)光罩的接收。LithoPE：確定光罩管理的規(guī)則、注意事項(xiàng)。O.I.的編制和更新。負(fù)責(zé)對(duì)MFG人員的Training和Certify。QE：新進(jìn)光罩的IQC，光罩返還Customer時(shí)的檢查。光罩外送時(shí)的包裝。PIE：制定光罩或產(chǎn)品的使用計(jì)劃。ReticleManagement:ResponsibiReticleManagement:ReticleOperationFlowShippingCassetteReticleStockerZaristodoN2cleaningNG,particlesRejectandSendtoMaskshoporcustomerReticleIncomingQuality