工控培訓(xùn)教程、手冊合集電鍍基礎(chǔ)知識

NICKEL DECORATIVE CLEANING& 及預(yù)鍍預(yù)

TROUBLEWHATISELECTROPLATING什么是電鍍？ THEDEPOSITIONOFAMETALLICCOATINGUPONANEGATIVELYCHARGEDCATHODEBYTHEPASSINGOFAN CTRICCURRENT 負的陰極的表陰面極表面WHATISTHEPURPOSE電鍍的目的 TOOBTAINAMETALLICCOATINGHAVINGCERTAINPROPERTIESSUCHASHARDNESS,w ANDTOREPRODUCEIDENTICALFORMSIN 是為了為了得到具有，種如硬性特特硬的性度度、光亮

、耐性及在

形要 SOURCEOFDIRECT A ASOLUTION INGTHESALTSOFTHEMETALTOBE (POSITIVEELECTRODE極 A OBJECT

NILDWHATISDIRECTCURRENT THEFLOWOFELECTRONSINTHEDIRECTIONBETWEENPOSITIVEANDNEGATIVEELECTRODESWHATISAPLATINGSOLUTION電鍍液是 ACONDUCTINGMEDIUMFORMOVEMENTF

ALIONSSOLUTIONBETWEENANANODEANDACATHODE WHATISpH什么是pH THEMEASUREMENTOFACIDITYOR ONASCALEFROM0TO 0TO6.9BEINGACIDICAND7.1TO14ALKALINEAND7.0BEINGNEUTRAL.HOWAREPLATINGSOLUTIONMAINTAINED HULL

YSISOFTHE PLATING ADDITIONOF MN PERIODIC REGULARINSPECTIONOFPARTSFOR PHYSICAL WHATISAMETALION AMETALIONISANATOMOFAMETALHAVINGAPOSITIVEELECTRICAL

去WHATARETHESOURCESOF IONS金屬離子來自何處 METALSALTSINPLATING 鍍中中的金屬 SOLUBLE 溶的的

陽WHATAREANODEBAGS什么是陽 ANODEBAGSAREPOROUSMEMBRANESPLACEDAROUNDANODESTOCOw TFORMINGONTHEDISSOLVING 扎,在陽極外面程生的中 BasicELEC 電的ELECTROCHEMISTRY電化PlatingCell電鍍RR++ANE陽極陽極CATE陰極陰極ANECATHODEREACTIONS Reductionofions 子還原反 Drawelectronsfromtheexternalcircuit 部電路中吸收子 TYPICALREACTION典型 Ni+++2e- +4H2O+

Ni(metal金屬2H2+ REACTIONSAnode陽 Oxidationofmetaltoions

屬

成 Releaseofelectronstoexternalcircuit 子

外部 TYPICALREACTION典型

Ni+++O2+2H2O+4e-O2+4H++4e-RATEOFCURRENTFLOW rs=s伏特特Os歐姆姆I電電壓阻電電阻FARADAY’SLAW法拉第定Factors要Amp

eEquivalentWeightflFARADAY’SLAW法拉第定bOneampereflowingforonesecondrepresentsonecoulomb.Faraday’lawstatesthat96,500coulombs(oneFaraday)willdepositonegramew alentweightofametal.Equivalentweightistheatomicweightofthemetaldividedbyit’svalence.的培安流1安培的電流通過的電量等1,5FARADAY’SLAWweightofmetal 96,500CoulombsDepositAt.Wtgrams96,500庫侖的庫鍍侖層的Valnce層WEIGHTOFNICKEL電鍍鎳的重KNOWNRS已知的條件條件已Cureae15s原子量原子量.t.Ni= Valene=化合價2CLCULT X13.7GRAMS xCALCULATINGTHICKNESSFROM從重量計算厚度Thickness densityx

1um=10-41mil=25.4EXAMPLEwt=0.136D.nsityofNi=8.9Area=4cm2

Thickness=8.9xAnswer=1.5CURRENTINcatcorroiCati氫Theexchangeofelectronsattheanodeandthecathodeorthetotalflowofcurrentateachelectrodeisalwaysequal.DEPOSITIONWITHH2伴隨著氫氣釋放的NETRTCathodeEfficiency IncreasoeCtPLATINGEFFICIENCYANDTIMEOFPLATINGEfficiyActualild實際鍍的鎳鎳X10際Theoretical(Faraday’sLaw FACTORSAFFECTINGPLATING影響電鍍電流的 HydrogenLiberation(cathode放氫氣釋氫氣釋放陰） OxygenLiberation(anode放氧氣釋氧氣釋放陽） ConcentrationPolarization(Diffusion化濃度極濃度極化擴） HydrogenE=Eolts伏特otentialdiffre電位差差)位Resist ofsolution)荷CURRE(IRESISTA(Ep=ChangeinpotentialdifferenceduetoPolarizationfrom POLARIZATIONEEP=R=IIECONCENTRATION CONCENTRATIONOFMETALIONSBUILDONTHESURFACEOFTHEANODE CONCENTRATIONOFTHEMETALIONSDECREASEATTHESURFACEOFTHE CHANGEINANODEAND CAUSES CONCENTRATIONN CATH

Ni +++

EFFCT影響影響HYDROGEN氫過電位 POLARIZATIONDUETOEVOLUTIONOFHYDROGENUPONASPECIFIEDELECTRODESURFACE THEEXCESSPOTENTIALABOV EEQUILIBRIUMPOTENTIALREQUIREDTOEVOLVEHYDROGENATTHECURRENTDENSITY 位后的位電后位的電位

HYDROGEN FACTORS要素素TYPEOF SURFACE

TYPEOFSOLUTION的液溶溶液的類型型類的液溶CURRENTDESI密流電度電流密度密流電度 HYDROGENOVERVOLTAGE(1

ELECTROMOTIVE電勢

ANYQUESTIONS 題嗎與與預(yù)預(yù)鍍與預(yù)CLEANING&PURPOSEFOR清洗的目的 TOPROVIDEADHESIONONTHESUBSEQUENTDEPOSITS TOOBTAINAHIGHQUALITYFINISH TOOBTAINTHEDESIREDPROPERTIESOFTHEDEPOSITS 望 EFFECTSOFIMPROPER不正 的影 POORBONDINGTOBASE PEELINGOFE SKIP 鍍漏鍍鍍 E 泡起泡泡 POOR PRECLEANING 的選 MECHANICALCLN清機 械機洗BLAN DIPH ALKALINEEI洗堿洗洗

ULTRASO ACIDEI酸酸洗洗ELECR CLEANERS劑如何工 散分分散 SAPONIFICATIO化皂化 分 DISPERSIONISAMETHODWHEREBYSOLIDPARTICLESAREBROKENDOWNTOSMALLPARTICLESBYTHEACTIONOFSURFACTANTSln ERCOMPONENTSINACLEANER.THEPRINCIPLEISEFFECTIVEFORRESIDUELEFTFROMPOLISHINGOPERATIONS 通過過表表面其洗 中 作。這這個分個原

散原則成個成則時 物 HOWCLEANERS清潔劑如何工作DISPERSION DIRT

TEDWITH 蓋

CLEANERS 散分散散 SAPONIFICATION化皂皂化化 皂化皂化皂 SAPONIFICATIONISTHECHEMICALACTIONBYWHICHFATTYACID,FATTYOILOROTHERREACTABLESOILISCONVERTEDTOAWATERSOLUBLE POUND,SOAP.ELEVATEDTEMPERATURES,CONCENTRATION,ANDpHPROMOTESTHESPEEDANDCOMPLETIONOFTHEHOWCLEANERS清洗劑如何工作SAPONIFICATION VEGETABLE SOLUBLEALKALI 溶性 堿性肥 CLEANERS SAPONIFICATION 化乳 EMULSIFICATIONISACHEMICALPROCESSBYWHICHSURFACTANTSPENETRATEOILSANDSOILSANDBREAKTHEMDOWNTO

WATERGLOBULESDISPERSEDSUSPENDEDIN 種，化表面學(xué)面學(xué)面活過活過活性程性劑，劑滲滲透透油物物，將它 液 和液HOWCLEANERS清洗劑如 MINERAL

COATEDWITH 蓋 化化TYPETYPEOF的種 SOLVENT ALKALINE洗堿洗洗 SPRAY ACID酸浸酸酸TYPEOF清洗的種類SOLVENTCLEANING溶劑 MIXTURESOFSUITABLESOLVENTSAND USEDINVAPOR在蒸汽蒸蒸汽除時 MINIMALUSEDUETOHEALTHANDENVIRONMENTALCONCERNS. ALKALINECLEANERS堿THREEMAJORCOMPONENTS BUILDERS-SODIUMHDXIDE氫氧化鈉

POTASSIUMHDXIDESILICES CONDENSEDHHES ADDITIVES-CHELATINGAGENTSTOCOUNTERACTEFFECTSOFHARDWATERANDMETALIONS.劑添加劑添螯合物可以消除硬水和金屬離子的影響 SURFACTANTS-DISPLACEANDDISPERSESOIL.LOWERSURFACETENSIONOFCLEANERATMETALSURFACEFORUNIFORMCOVERAGE. 液 TYPESOFALKALINE堿洗的類型 SOAK浸HIGHINFINITYFOROILSANDGREASESDUEHIGH DESIGNEDFOR 洗 SPRAY噴MECHANICAL EMENTAND LOW 泡ALKALINE CONC.-15-90TEMP.-50-82TIME-1-10

CONC.-2-15TEMP.-43-66TIME 15-60TYPESOFALKALINE R-GREATEST EVOLUTIONREDUCE-DEPOSITSSMUT臟物會沉積到陰極上 ANODIC-R 陽REMOVE-TOLERANCETOMETAL-FORMS-FORMSEFL氧形成氧化膜TYPESOFALKALINE堿洗的類型 ULTRASONIC–SOAKENERGYFROMSOUNDWAVESBEYONDTHEAUDIBLERANGEBREAKSDOWNDIRTPARTICLESDUETOFREQUENCYTHATRANGEOF15TO40kHz.將污污物物微微粒粒分分解由于頻15-40Kz之間間，，超將污污物物微微粒粒分分解ALKALINECLEANINGCATHODIC陰極電陰除極油電除油bHYDROGENLIBERATEDATTHECATHODE.THEVOLUMEOFTHEHYDROGENISTWICETHATOFOXYGENGENERATETHEANODE. 放，氫氫氣氣氣量，是陽陽極極釋釋放放的的氧氧 ACTIVATES 表化表 CERTAINOXIDE ARE 膜 ADISADVANTAGEISTHATMETALLICIONSCANDEPOSITONTHEWORKASALOOSEADHERENT 的 ALKALINECLEANING堿ANODIC OXYGENLIBERATEDATTHE THISOFCLEANINGWILLREMOVE METALLICCONTAMINATESWILLNOTON 沉 FORMS 氧產(chǎn)化生膜氧化 PASSIVATES 表化表ELECTROCLEANING電解除油反ANODEREO陽陽極反應(yīng)應(yīng)反極陽4(OH)--4e 2O+O2CATHODEREO陰陰極反應(yīng)應(yīng)反極4H2O+ 4(OH)-+ALKALINECLEANING ULTRASONIC超聲 ULTRASONICGENERATORSAREUSEDTOCREATESOUNDWAVESWHICHINTURNARECONVERTEDWITHINTHESOLUTIONTOMECHANICALENERGY.

，被轉(zhuǎn) ULTRASONICENERGYALTERNA YCOMPRESSESANDEXPANDSTHESOLUTIONWHICHPRODUCESSEVERALCONCURRENTEFFECTS.超生生波生

性地 CAVITATIONDUETOFREQUENCYASSISTSPHYSICALREMOVALOF 于頻

導(dǎo)

的氣

現(xiàn)

污ALKALINECLEANING SPRAYCLEANING噴射 SOLUTIONISUSUALLYMILDLYDEPENDINGUPONTHEBASE 材， ，常含含有有有微微堿堿性性 PLISHEDBY THECLEANINGSOLUTIONTHROUGHASERIESOFPIPESAND ACTIONOFPHYSICALIMPACTANDCHEMICALACTIONREMOVESDUST,METALFINES,CARBONSMUTANDOTHERRESIDUES. 它。的

化、學(xué)金反屬金反 TYPEOFCLEANINGACIDPICKLING WHYDOWEPICKLE? TOREMOVEOXIDESFROMTHESURFACEOFTHEMETALTOOBTAINGOODBONDINGOFTHESUBSEQUENTDEPOSIT. NEUTRALIZEANYRESIDUALALKALINEFILMLEFTTHE 表。面 ACIDPICKLING過酸去氧化CHEMISTRYOFPICKLING過酸的化學(xué) ACIDBEH2OSALTSulfuricAcid+Caustic Water+Sodium硫酸硫酸硫酸化鈉氫氧氫氧化鈉化鈉氫氧 ACID酸+METL2SALTSulfuricAcid+ Hydrogen+Ferrous ACID酸+MTLE水lAcid+Copper硫酸硫酸硫酸銅氧化氧化銅銅氧化

Water+CopperACIDMT屬金屬金 CHEMICALS過酸使用的化學(xué) H2SO4or不銹鋼不銹鋼不銹 ACIDSALTS(N4H)酸性鹽酸性COPPER

Hww.PLC

orCu鋁

ORGANICCIDSACIDFORMINGTSH2SO4,H3PO4,HNO3orZINC& TSOAKCLEANER熱浸清洗 NON 發(fā)生浸的 BUFFING 除 USEDASULTRASONIC超聲聲波聲波清用清 LIGHTDIRTANDSOIL 微臟物污污物去除CLEANING&清洗與過酸活化SUMMARY總 PRE-CLEANING-VERY預(yù)清清預(yù)洗清常洗非 SELECTIONOFPRE-CLEANINGCYCLEISDEPENDENTONNATUREOFSOIL&BASEMETAL. ELECTRO-CLEANINGISESSENTIALINPRODUCINGHIGHQUALITYMETALDEPOSITS. 質(zhì)，，必需需的 THOROUGHRINSINGAFTEREVERYCLEANINGANDPICKLINGSOLUTIONISIMPORTANTIN PRODUCTIONOFHIGHQUALITYDEPOSITS. 鍍每每一個除油，和和過過酸酸步步驟驟后后的的 常重要 CLEANEDANDRINSEDPARTSAREPICKLEDTOREMOVEOXIDESAND ACTIVATETHESURFACEOFTHEBASE 為 BRIGHT OPPER BRIGHTACIDCOPPERAPPLICATOS應(yīng)用用 telZincDieCing

INDUSTRIALElectrofoElectrotpBras黃銅黃銅PlasAluminum鋁

ElectrocladingStop-OffinCase ACIDCOPPERPROCESS BRIG GOOD

U GOOD DC ld. MIR

FINEGRAIN EASYTO

GOOD FAST

WhyAcidCopper為什么用酸ProvidesLevelingofPolishing/Buffing180 NGLIEEVLLEVELIGL宏觀上的均THEABILITYTODEPOSITMETALUNIFORMLYOVERABROADCURRENTDENSITYRANGE

微觀上的均THEABILITYTOEPOSITMETALGROOVES,CRACKSANDSURFACEIMPERFECTIONSOFMICROSCOPICNATURE

AcpProvidesLevelingof%Leveling=Tg-TsxTg Tg Poor/No

Good好的填平觀WhyAcidCopper為酸ProvidesABright,EasytoBuffSurfaceforCoverageVeryMinorBlemishesinCastings,Aluminumor 陷的 BrightSurfaceThatRequiresLittle/NoLongTermProtectionAgainstCorrosion

耐蝕耐蝕SurfacePores 表pot微MicroscopicSectionOfAPorousPlatingHasBridgedSurface鍍鍍層 鍍鍍層TYPICALBATH CopperSulate20-32oz/gal150240 Sulfuriccid Cho

6-12oz/gal(45-9020-120ppm e AnodeCurrent CathodeCurrent

72-90°F(22-15-30(1.5-3.020-80(2.0-8.0BATCY槽液化學(xué)物物液

SO444 極陰極陽陽極極4

SO極陰

極陽陽極極 AcidCopper鍍銅電酸酸銅電鍍鍍銅電IngCopperSate硫酸銅銅8-225g/LSulfuricAcid硫酸酸45-90g/LAcidCopper鍍銅電酸酸銅電鍍鍍銅電InglauUlta加添添加劑劑加Ult

80-1208-100.3-0.50.3-0.5COPPERULAE硫酸銅銅硫 HIGHCON. OWCON. LOSS

LOSSINLEVELINGANDBATHEVIONDUCII,并>240

<113FunctionofIngredients各Lowcoppercontentcancausereducedleveling,slowdeposition,andanarrowcurrentdensityrange 圍范窄窄Concentrations<150g/Lcoppersulfatecanreducebrightnessandleveling 50 性平能性能Concentrations>248g/Lcoppersulfatemayproducecrystalson walls,andanodebags,yieldingroughdeposits,andpooranodecorrosion.

48/L大于槽會陽、極槽、袋 t113\生At 和 LowCopper低硫低銅酸銅TheHullCellindicatesthatat113g/LCopperSulfateadepositthatisburnedatveryhighcurrentdensitiesis113g/L 下濃的酸銅液中沉113g/L 下濃的酸銅液中沉積屬在高電流密出現(xiàn)燒焦的情SULFURICD硫酸硫 GRAIN SOLUTION REDUCESANODE IMPROVESTHROWINGSULFURICD硫酸硫HIGHN. LOWC. ANODECORROSI

HCD POOR FunctionofIngredientsConcentrations>180g/LSulfuricAcid=highcurrentdensityareaburningandanodepassivation. Concentrations<60SulfuricAcid=highplatingvoltagesandslowplating180

<23LowSulfuricAcid低硫低酸SmallLossofSmallLoss SmallLossLowLow(37g/L)SulfuricHighSulfuricAcid高硫高酸SmallSmallLossHigh(110g/L)SulfuricESDRLOICHCHLRDSESDL物40to100 IMPROVES度亮光高提提高光亮度 高 IMPROVES平填高提提高填平平填 IMPROVESANODE改善陽極溶ESDRLOICHCHLRDSESDL物ONICH.HHIGOC.COICHCNCO.LOC.低濃ONC LOSSOFLEVELINGANDBRIGHTNESSLEVELING>120ppm

DULLNESSINHCD POOR 紋條起起條紋

POORANODEEffectofChloride050ppm050ppm375rksWithBrightenerForFullBrightnessAndLeveling

助，陽極 EffectofChlorideDullAtDullAtCurrent HullCellPlatedWithChlorideat150 50 EffectofChloride氯化物濃度的影eoLow(15ppm)低氯離子濃度ChloridevsAnode氯化物與陽極外WhiteFilm=High=NormalAnodeHullCell

正常的陽極外seivtiAddAddiisiiAd添ELEKTRAEK- EK-PanelPlatedInSolutionNoseivtiAddAddiisiiAd添HullCellPanelWithCurrentDensitydHullCellPanelWithCurrentDensityAdd. Add. ed劑 dteAdd. Add.添加劑添加劑添加劑添加劑添加HullCellPlated,WithAdd.1@1.0%,Add2@0.25%添加劑seivtiAddAddiisiiAd添dAdd. Add.添加劑添加劑添加劑添加劑添加劑LowAdd.2(0.1%添2體體積百分比）seivtiAddAddiisiiAd添dteAdd

Dull&22HighAdd.2(1.0%/加2百體積百分比seivtiAddAddiisiiAd添PanelPlatedinSolutionWith1PanelPlatedinSolutionWith1At1.5%/Voe溶液中含SmallLoss2Add. 2CONTAMINANTS雜 鋅 鉻 鋁

機有物機 WETTING 濕潤劑濕 IMPROPER IRON鐵

CONTAMINANTS雜 HIGH UPTO2.3 高，可可容高g DECREASESPLATING REDUCESCOPPERSULPHATE BUILDSCOPPERSULPHATEIN 槽 中置換 酸CONTAMINS雜質(zhì)質(zhì)ZINC HIGH UPTO2.3度忍容高 REDUCES

. REDUCESCOPPERSULPHATECONTAMINANTS雜NICKEL HIGH PTO2.3高容，. REDUCESCOPPERSULPHATE

酸

的可溶CONTAMINS雜質(zhì)質(zhì)CHROMIUM OVER100

BRIGHTE SKIP POOR

焦燒焦焦鍍漏鍍鍍紋條紋紋差力結(jié)合結(jié)差力CONTAMINS雜質(zhì)質(zhì)FILTER L.C.D. ROUGHNESS, USEDIATOMACEOUS土使用硅藻土用–

-Inorganicurts無機雜質(zhì)機雜Goodleae好 度 度Atconcentrations>1000mg/L,ironandnickelreducetheelectrolyteconductivityandthrowing0HullCellPanelPlatedInAcidCopperContaining1,000ppmZinc含1000ppmOrganic質(zhì)機雜有有機雜質(zhì)質(zhì)機雜Canproducedullappearanceinlowcurrentdensityareas在低密度區(qū)會產(chǎn)生暗的外觀Sourc lins缸的內(nèi)襯tadBrightenerBreakdownProductsTreatent處理理ActivatedCarbonremovesorgansInsomecasesahydrogenperoxidetreatmentalsobe CONTAMINS雜質(zhì)質(zhì)N DULLNESS COARSEGRAINEDDEPOSIT BURNN STRIATION LOSSOFLEVEurtTrea MoveSolutionToSeparate Add3-12g/LActivated 1 Agitate

AllowToSettle2hours(butnottoolong,8hours2長不要太長多8 TransferToSecondTreatment ,TestForPresence IfCarbonFree,TransferBackTo如果沒有碳粉了，則泵回原來的電鍍槽OxidationTreatments氧化HydrogenPeroxide雙氧氧水雙水OxidizeComplexOrganics 化1mL/L(35%

雜的有Dilute50% ding添加%PotassiumPermanganate

酸?AmountRequiredVaries

的

加DeterminewithHullCell

氏

CathodeCurrentDensityActualCurrentDensityDependsOnTheDistanceBetweenASpotOnThePartAndTheAnode 度A 點和陽極間極距間離 距CathodeCurrentDensityAverageCCD=AmperesofCurrentAreainSquare 極=電流密度 HighCurrentDensity MediumCurrentDensity LowCurrentDensity PlatingThicknessThickness(mils)=A/ft2x Ifamps/ft2=15,and ngtimeis20minutes(0.33hours),thenthethicknesswillbe:），則厚度為 ：度厚ThicknessThickness(mils)=15x =0.28 PlatingTimeCalculatingPlatingTime 鍍 Ifwewant20uofthickness,platingat3 們20u的Adhicknessu)=A/dm2xminx 度20u=3A/dm2x33.3minx

Agitatioevel攪拌程度程度攪AgtiAgti中AgitationLevelPanelPanelPlatedWithNo AnodesforAcidCopperPhosphorized磷銅銅銅(0.02-0.06%P)rolledcopperanodesor phorized含含0.02-0.06%的磷的銅磷 ANODES銅陽銅極ANODESWITH0.02-0.065%含.02–0.065% 刺 HIGHBRIGHTENER POOR POORANODE 溶解不 ODS銅陽極陽極ANODESS陽極籃陽極PartiallyTitaniumBasket

Anodesshouldbe3-5inchesshorterthanthelongestrackbeingANODEBAGS陽極陽袋LooseFitIsBagTheAnodesUsingDynelOrLooseFitIs或聚丙烯材料做 填！裝TopsofBgsNeedToABOVELiquid 口！須 ANYQUESTIONS NICKEL鎳HISTORYOFNICKEL 1840-JosephShoreappliedforfirst1840年,JosephShore申請了第一個專利 1842-Bottger-usednickelammonium1842年ttr 了胺鹽鎳 1849-Roseleur-goodnickeldeposit1849年Roseleur得到了良好 1869-Adams-US.patent-93,157withammoniumsalts

的鎳鍍層1869年Adams申請了胺鹽鍍鎳的專國專利93,5）HISTORYOFNICKEL 1878-Weston-U.S.patent-211,071boricacid 1906-Bancroft-useofchlorides使用化 1916-O.P.Watts-thefirstformulationforhighcurrentdensity第一個高流密度的槽液標準配 1936-Schlotter-firstrealbrightnickelplatingprocess第一次真正的光亮鎳電 1945-Harshaw-U.Spatentforsemi-brightusingcoumarin香豆素用于鍍半光美國專利NICKELOS鍍鎳工藝工藝鍍TYPESOFNICKELSOLUTIONS. NICKELSTRIKE NICKELSRIKE( nT’ SEMIBRIGHTIEL HIGHSULFURNICKELSRIKE BRIGHTIL MICROPOROUSIEL微孔鎳封鎳） NOBLENICKEL NICKELSLTE ELECTROLESSILDISTRIBUCATHNDENICKELPROCESSTYPESOFNICKELSOLUTIONS.鎳 NICKELSTRIKE(WOOD’SREASONFOR INITIALNICKELLAYERFORADHESION. 的． IILNGN 的． LOWpH<1.0H值H<NICKELOS鍍鎳工藝工藝鍍 TYPESOFNICKELSOLUTIONS.NICKELSTRIKE(WOOD’SCOPII CHL4 HYDROCHLORIC酸鹽酸1-15l. BORIC酸硼酸硼bp

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